Femtosecond laser fabrication of high reflectivity micromirrors

Author(s): D. Brodoceanu, G. D. Cole, N. Kiesel, M. Aspelmeyer, D. Bäuerle

Journal: Applied Physics Letters

Volume: 97

Page(s): 041104

Year: 2010

DOI Number: 10.1063/1.3467846

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High-quality freestanding micromirrors consisting of 40 dielectric layers on silicon have been fabricated by ultrashort-pulse laser ablation in combination with laser-assisted wet chemical etching. Backside material removal enables direct access to both faces of the dielectric coating. The amplitude reflectance of the micromirrors has been determined by Fabry–Pérot interferometry; a finesse in excess of 8900±700, corresponding to a reflectivity exceeding 99.95%, has been found. The mechanical quality factor, Q, of the microresonators, measured at 20 K, is determined to be between 5000 and 6000.

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