Absorptive masks of light: A useful tool for spatial probing in atom optics

Author(s): C. Keller, R. Abfalterer, S. Bernet, J. Schmiedmayer, A. Zeilinger

Journal: J. Vac. Sci. Tech.

Volume: 16

Page(s): 3850-3854

Year: 1998

DOI Number: 10.1116/1.590422


We demonstrate periodic localization of neutral atoms of better than 65 nm behind amplitude, i.e., absorptive masks made of light. With these masks, produced by a standing on resonant light wave, it is possible to create and to probe spatially well-defined atomic distributions. Applications of such absorptive masks range from atom lithography to fundamental atom optical experiments. As two examples we show how to use these gratings as a tool to measure the evolution of an atomic wave field behind a static Bragg crystal and its dependence on the incidence angle of the atomic beam and how to demonstrate the frequency shift of atoms diffracted at a modulated Bragg crystal in a beating experiment.

Note: SZ

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