Wave and Particle in Molecular Interference Lithography - “Editor’s Choice” for interdisciplinary cross reading

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30. Dec 2009  — To promote reading across fields, the editors of Physical Review Letters offer "Suggestions" each week of papers that they hope will lead readers to explore other areas of physics.

Wave and Particle in Molecular Interference Lithography

Thomas Juffmann, Stefan Truppe, Philipp Geyer, András G. Major, Sarayut Deachapunya, Hendrik Ulbricht, and Markus Arndt

Abstract:
The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here we report on the first experimental demonstration of quantum interference lithography with complex molecules. Molecular matter-wave interference patterns are deposited onto a reconstructed Si(111) 77 surface and imaged using scanning tunneling microscopy. Thereby both the particle and the quantum wave character of the molecules can be visualized in one and the same image. This new approach to nanolithography therefore also represents a sensitive new detection scheme for quantum interference experiments.


[Phys. Rev. Lett. 103, 263601 ] Published Tue Dec 29, 2009